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Thin-film systems
Kuchařík, Jan ; Máca, Josef (referee) ; Zatloukal, Miroslav (advisor)
This bachelor thesis concerns to create of thin films on various types of substrates. In the theoretical parts is an overview of the formation of thin films using several techniques. The thesis contains an overview of substrate cleaning processes before the deposition of layer plates and tools for evaluating their properties. Finally, the masking method is discussed. In the experimental part, the acquaintance with the NP - 12 sputtering device and the production of samples took place. The adhesion of the produced samples was evaluated. Electrolysis of samples with titanium coated followed. Finally, the silicon substrate was masked.
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Vacuum technologies for creating thin-film systems
Kuchařík, Jan ; Šafl, Pavel (referee) ; Zatloukal, Miroslav (advisor)
The theoretical part of this theses deals with the formation of thin films by vacuum methods. It is a chemical and physical deposition from the gas phase in vacuum environment. Chemical deposition takes place at elevated temperatures, which accelerate reactions. Physical deposition is most often only condensation of vapors of evaporated material. Physical methods are vacuum evaporation, as well as cathodic, ionic, reactive and magnetron sputtering. The formation of thin layers takes place according to 3 known mechanisms. Substrates must be surface treated before the deposition process. The quality of thin films is examined from several perspectives. The practical part is devoted to the production of a thin-film system of copper and tin on a glass substrate. These layers are separated by three different barrier metals. Subsequently, the prepared samples were exposed to thermal stress and were monitored by electron microscope. Diffusion processes at the thin film interface were compared.
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Vacuum technologies for creating thin-film systems
Kuchařík, Jan ; Šafl, Pavel (referee) ; Zatloukal, Miroslav (advisor)
The theoretical part of this theses deals with the formation of thin films by vacuum methods. It is a chemical and physical deposition from the gas phase in vacuum environment. Chemical deposition takes place at elevated temperatures, which accelerate reactions. Physical deposition is most often only condensation of vapors of evaporated material. Physical methods are vacuum evaporation, as well as cathodic, ionic, reactive and magnetron sputtering. The formation of thin layers takes place according to 3 known mechanisms. Substrates must be surface treated before the deposition process. The quality of thin films is examined from several perspectives. The practical part is devoted to the production of a thin-film system of copper and tin on a glass substrate. These layers are separated by three different barrier metals. Subsequently, the prepared samples were exposed to thermal stress and were monitored by electron microscope. Diffusion processes at the thin film interface were compared.
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Thin-film systems
Kuchařík, Jan ; Máca, Josef (referee) ; Zatloukal, Miroslav (advisor)
This bachelor thesis concerns to create of thin films on various types of substrates. In the theoretical parts is an overview of the formation of thin films using several techniques. The thesis contains an overview of substrate cleaning processes before the deposition of layer plates and tools for evaluating their properties. Finally, the masking method is discussed. In the experimental part, the acquaintance with the NP - 12 sputtering device and the production of samples took place. The adhesion of the produced samples was evaluated. Electrolysis of samples with titanium coated followed. Finally, the silicon substrate was masked.
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